Title:
高周波電子源
Document Type and Number:
Japanese Patent JP4409846
Kind Code:
B2
Abstract:
The high frequency electron source has a discharge chamber (11) with at least one gas inlet (14) for a gas to be ionized and at least one extraction opening (16) for electrons. The discharge chamber is at least partly enclosed by at least one electrode (12a) and a keeper electrode (12b) and a high frequency field is applied between the electrodes. The discharge chamber can be enclosed by a plasma chamber.
Inventors:
Carl-Heinz Chartner
Horst robe
Hans Jürgen Reiter
Hans-Peter Harman
Horst robe
Hans Jürgen Reiter
Hans-Peter Harman
Application Number:
JP2003103276A
Publication Date:
February 03, 2010
Filing Date:
April 07, 2003
Export Citation:
Assignee:
Stork Fokker AESP BV
International Classes:
F03H1/00; H01J3/02
Domestic Patent References:
| JP2000161202A | ||||
| JP2000130316A | ||||
| JP62185324A | ||||
| JP62047781U | ||||
| JP5073915B2 | ||||
| JP5073914B2 |
Foreign References:
| US5003226 |
Attorney, Agent or Firm:
Takashi Watanabe
Masatake Shiga
Tadashi Takahashi
Masakazu Aoyama
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama
Shinya Mitsuhiro
Masatake Shiga
Tadashi Takahashi
Masakazu Aoyama
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama
Shinya Mitsuhiro