Title:
前駆体の第３級アミン溶液を用いる蒸気源
Document Type and Number:
Japanese Patent JP6440695
Kind Code:
B2
Abstract:
This disclosure relates to tertiary amine solutions of metal precursors used for chemical vapor deposition or atomic layer deposition. The tertiary amine solutions have many advantages. They dissolve high concentrations of non-polar precursors without reacting with them. They do not supply impurities such as oxygen or halogens to the material being produced, nor do they etch or corrode them. Vaporization rates can be chosen so that the solute and solvent may be evaporated simultaneously, have high flash points, and low flammability. Small droplets may be formed easily which facilitate rapid evaporation without decomposition of he dissolved metal precursor to supply vapors for chemical vapor deposition or atomic layer deposition processes.
Inventors:
Roy Gerald Gordon
Application Number:
JP2016518035A
Publication Date:
December 19, 2018
Filing Date:
June 06, 2014
Export Citation:
Assignee:
PRESIDENT AND FELLOWS OFHARVARD COLLEGE
International Classes:
C23C16/18; C07F1/08; C07F5/00; C07F7/22; C07F13/00; C07F15/00; C07F15/04; C07F15/06; C09D7/63; H01L21/31
Domestic Patent References:
| JP2003522827A |
Foreign References:
| WO2012087794A1 |
Attorney, Agent or Firm:
Mitsuo Tanaka
Hiroshi Yamazaki
Tsuyoshi Sato
Hiroshi Yamazaki
Tsuyoshi Sato