Title:
A space graphic display device provided with the manufacturing method of a reflective mold face symmetrical image formation element, the reflective mold face symmetrical image formation element, and the above-mentioned reflective mold face symmetrical image formation element
Document Type and Number:
Japanese Patent JP6104904
Kind Code:
B2
Abstract:
[Problem] To provide a method for manufacturing a reflective plane-symmetrical image-formation element, a reflective plane-symmetrical image-formation element manufactured using the method, and a space-image display device provided with a reflective plane-symmetrical image-formation element manufactured using the method, it being possible to minimize fracturing of parallel mirrors, minimize the peeling of adhesive and separating of parallel mirrors, and enlarge the reflective plane-symmetrical image-formation element by improving optical precision. [Solution] The method for manufacturing a reflective plane-symmetrical image-formation element is provided with: a layering step for forming a parallel mirror block; an anchoring step for anchoring support members at both ends of the parallel mirror block in a direction perpendicular at least to the light-reflecting main surface to form a block; a cutting step for cutting the block at regular intervals in a direction perpendicular to the light-reflecting main surface to form a first mirror sheet in which a plurality of first light-reflecting surfaces are aligned in parallel, and forming at least a second mirror sheet in which a plurality of second light-reflecting surfaces are aligned in parallel; and a cementing step for cementing the first mirror sheet and the second mirror sheet such that the first light-reflecting surfaces and the second light-reflecting surfaces are perpendicular, to form the reflective plane-symmetrical image-formation element.
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Inventors:
Hirokazu Hashikawa
Application Number:
JP2014518138A
Publication Date:
March 29, 2017
Filing Date:
May 30, 2012
Export Citation:
Assignee:
Asukanet Co., Ltd.
International Classes:
G02B5/08; G02B5/00; G02B17/00; G02B30/60; G02B30/00
Domestic Patent References:
| JP2011081300A | ||||
| JP2003057417A | ||||
| JP2000199810A | ||||
| JP2004121978A |
Foreign References:
| WO2009136578A1 |
Attorney, Agent or Firm:
Fujio Nakamae
Takahashi Hayashi & Partners
Takahashi Hayashi & Partners
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