Title:
A sputtering target and a formation method for the same by rotation and axial forge
Document Type and Number:
Japanese Patent JP6023605
Kind Code:
B2
Abstract:
A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.
Inventors:
John P. Matera
Robert bee ford
Charles E. Jr. Wickersham
Robert bee ford
Charles E. Jr. Wickersham
Application Number:
JP2013026829A
Publication Date:
November 09, 2016
Filing Date:
February 14, 2013
Export Citation:
Assignee:
Global Advanced Metals, USS.A., Incorporated
International Classes:
C23C14/34; B21J9/02; C22C14/00; C22C16/00; C22C27/02; C22F1/00; C22F1/04; C22F1/16; C22F1/18
Domestic Patent References:
| JP2004107758A |
Foreign References:
| US20030056619 |
Attorney, Agent or Firm:
Tetsuro Ikuta
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