Title:
ステージ
Document Type and Number:
Japanese Patent JP7440304
Kind Code:
B2
Abstract:
To provide an evaporator (stage) for wettability of a molten metal, or for metal film deposition making a temperature uniform.SOLUTION: There is provided a stage 1 installed in a vapor deposition apparatus chamber, for evaporating a molten metal in order to deposit the metal on an object. In the stage 1, a surface of the stage 1 has a hollow part 3 for storing the molten metal, and in the hollow part 3, a width of the hollow part 3 in a center part region 7 of the stage 1 is larger than a width WE of the hollow part 3 in an end region 5 of the stage 1.SELECTED DRAWING: Figure 1
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Inventors:
Mikio Araki
Application Number:
JP2020039166A
Publication Date:
February 28, 2024
Filing Date:
March 06, 2020
Export Citation:
Assignee:
Advantech Co., Ltd.
International Classes:
C23C14/24
Domestic Patent References:
| JP5230631A | ||||
| JP2007046106A | ||||
| JP60117855U | ||||
| JP56123368A | ||||
| JP6212425A |
Attorney, Agent or Firm:
Takayuki Hirose
Daisuke Seki
Daisuke Seki
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