Title:
A substrate and a manufacturing method for the same of the mirror for EUV lithography
Document Type and Number:
Japanese Patent JP5934698
Kind Code:
B2
Abstract:
For the production of mirrors for EUV lithography, substrates are suggested having a mean relative thermal longitudinal expansion of no more than 10 ppb across a temperature difference ΔT of 15° C. and a zero-crossing temperature in the range between 20° C. and 40° C. For this purpose, at least one first and one second material having low thermal expansion coefficients and opposite gradients of the relative thermal expansion as a function of temperature are selected and a substrate is produced by mixing and bonding these materials.
Inventors:
Julian Curler
Wilfried Klaus
Michael Gerhard
Wilfried Klaus
Michael Gerhard
Application Number:
JP2013508482A
Publication Date:
June 15, 2016
Filing Date:
May 03, 2011
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F1/22; G03F7/20; G03F1/60
Domestic Patent References:
| JP2005231994A | ||||
| JP2005194118A | ||||
| JP2005104820A | ||||
| JP2010064950A | ||||
| JP2003267789A | ||||
| JP2005507353A | ||||
| JP2011151386A |
Foreign References:
| WO2009070223A1 | ||||
| WO2009107858A1 |
Attorney, Agent or Firm:
Kenji Sugimura
Groundwork Kenichi
Tsubouchi Shin
Groundwork Kenichi
Tsubouchi Shin
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