Title:
A substrate mounting base and a plasma etching device
Document Type and Number:
Japanese Patent JP5917946
Kind Code:
B2
Abstract:
A substrate mounting table and a plasma etching apparatus can supply a power to a temperature controlling heater electrode effectively while preventing atmosphere from being leaked and preventing processing uniformity in a surface of a substrate from being deteriorated. The substrate mounting table and the plasma etching apparatus include an insulating member having therein an electrostatic chuck electrode and a temperature controlling heater electrode; a plate-shaped temperature controlling member having therein a temperature controlling medium path through which a temperature controlling medium is circulated; a cylindrical member made of an insulating material and provided within a through hole formed in the plate-shaped temperature controlling member; and a lead line, provided within the cylindrical member, having one end connected to the temperature controlling heater electrode and the other end connected to a connecting terminal provided at a bottom surface side of the cylindrical member.
Inventors:
Katsuyuki Koizumi
Yudai Ueda
Torii Kengo
Takebayashi Hiroshi
Yudai Ueda
Torii Kengo
Takebayashi Hiroshi
Application Number:
JP2012038734A
Publication Date:
May 18, 2016
Filing Date:
February 24, 2012
Export Citation:
Assignee:
東京エレクトロン株式会社
日本碍子株式会社
日本碍子株式会社
International Classes:
H01L21/3065; H01L21/683
Domestic Patent References:
| JP2010157559A | ||||
| JP2003059789A | ||||
| JP7074234A | ||||
| JP2002324834A |
Attorney, Agent or Firm:
Patent Business Corporation Sakura International Patent Office
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