A substrate processing device and a substrate treating method

Title:

A substrate processing device and a substrate treating method

Document Type and Number:

Japanese Patent JP5952007

Kind Code:

B2

Inventors:

Tomoaki Aihara
Ichiro Mitsuyoshi
Naoji Maekawa
Keiichi Tsuchiya

Application Number:

JP2012014887A

Publication Date:

July 13, 2016

Filing Date:

January 27, 2012

Export Citation:

Assignee:

Screen Holdings Co., Ltd.

International Classes:

H01L21/304

Domestic Patent References:

Attorney, Agent or Firm:

Masahiro Matsusaka
Tsutomu Tanaka
Masamichi Ida

Previous Patent: A fluorene derivative and a light emitting element

Next Patent: BLOCK FOR REVETMENT