Title:
A support table and a device manufacturing method of a lithography device and a lithography device
Document Type and Number:
Japanese Patent JP6080875
Kind Code:
B2
Abstract:
A support table (WT) configured to support a substrate (W), the support table having a support section (22) to support the substrate and a conditioning system (21) to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units (23) that are independently controllable.
Inventors:
Kunen, Johann, Hertordis, Cornelis
Jacobs, Johannes, Henrykas, Wilhelms
Felspa Gate Cohen, Cornelis, Wilhelms
Van der ham, ronald
Thomas, Ivo, Adam, Johannes
Houben, Martin
Laurent, Thibeau, Simon, Mathieu
Corcoran, Gregory, Martin, Mason
Brox, Root, Hendricus, Martinus, Johannes
Pieters, Gelben
Gunter, Peter, Rain, Joseph
Lemier, Marinus, Jan
Darks, Thunder, Katharina, Liner
Jacobs, Johannes, Henrykas, Wilhelms
Felspa Gate Cohen, Cornelis, Wilhelms
Van der ham, ronald
Thomas, Ivo, Adam, Johannes
Houben, Martin
Laurent, Thibeau, Simon, Mathieu
Corcoran, Gregory, Martin, Mason
Brox, Root, Hendricus, Martinus, Johannes
Pieters, Gelben
Gunter, Peter, Rain, Joseph
Lemier, Marinus, Jan
Darks, Thunder, Katharina, Liner
Application Number:
JP2015003993A
Publication Date:
February 15, 2017
Filing Date:
January 13, 2015
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20; G02B19/00; H01L21/683
Domestic Patent References:
| JP2009272631A | ||||
| JP2005197447A | ||||
| JP2009105443A | ||||
| JP6053298A | ||||
| JP2008262963A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki