Title:
メインＲＦ発生器およびエッジＲＦ発生器を同期させることによってプラズマチャンバ内のエッジ領域に関連する予め定められた要素を達成するためのシステムおよび方法
Document Type and Number:
Japanese Patent JP7335999
Kind Code:
B2
Abstract:
Systems and methods for achieving a pre-determined factor associated with the edge region within the plasma chamber is described. One of the methods includes providing an RF signal to a main electrode within the plasma chamber. The RF signal is generated based on a frequency of operation of a first RF generator. The method further includes providing another RF signal to an edge electrode within the plasma chamber. The other RF signal is generated based on the frequency of operation of the first RF generator. The method includes receiving a first measurement of a variable, receiving a second measurement of the variable, and modifying a phase of the other RF signal based on the first measurement and the second measurement. The method includes changing a magnitude of a variable associated with a second RF generator to achieve the pre-determined factor.
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Inventors:
Alexei Malaktanov
Felix Kozakovich
Michael Sea Kellogg
John Patrick Holland
Zeegan Chen
Kennis Lucchesi
Lin Jiao
Felix Kozakovich
Michael Sea Kellogg
John Patrick Holland
Zeegan Chen
Kennis Lucchesi
Lin Jiao
Application Number:
JP2022077412A
Publication Date:
August 30, 2023
Filing Date:
May 10, 2022
Export Citation:
Assignee:
LAM RESEARCH CORPORATION
International Classes:
H05H1/46; H01L21/3065; H01L21/31
Domestic Patent References:
| JP2006156530A | ||||
| JP2014239029A | ||||
| JP2000507739A |
Foreign References:
| US20100015357 |
Attorney, Agent or Firm:
Patent Attorney Corporation Meisei International Patent Office
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