Title:
原子及び分子イオンで表面を照射するために有用な振動磁場をワーキング・ギャップにおいて生成するためのシステム及び方法
Document Type and Number:
Japanese Patent JP3975363
Kind Code:
B2
Abstract:
A deflection apparatus for high perveance ion beams, operating at 20Hz fundamental and substantially higher order harmonics, has a magnetic structure formed of laminations (72) with thickness in range between 0.2 and 1 millimeter. A compensator with similar laminated structures (71,75) with resonant excitation circuit, operating at 20 Hz or higher, is in phase locked relationship with the frequency of the previously deflected beam. Other features with broader applicability to produce strong magnetic field in magnetic gap are shown.
Inventors:
Gravish, Hilton, F.
Application Number:
JP2005006925A
Publication Date:
September 12, 2007
Filing Date:
January 13, 2005
Export Citation:
Assignee:
Nissin Ion Equipment Co., Ltd.
International Classes:
C23C14/48; G21K1/093; H01J37/317; H01F3/02; H01F7/20; H01J3/32; H01J29/76; H01J37/04; H01J37/09; H01J37/12; H01J37/147; H01L21/02; H01L21/265; H01L27/12
Domestic Patent References:
| JP3240230A |
Foreign References:
| WO1991013457A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Katsuro Tanaka
Shinji Oga
Katsuro Tanaka
Shinji Oga