Title:
PLASMA TREATMENT EQUIPMENT
Document Type and Number:
Japanese Patent JP3212253
Kind Code:
B2
Abstract:
PURPOSE: To prevent transfer of a shadow formed by a meshy metal by a method wherein a part of a second electrode is provided in a part surrounded by an insulator, while the meshy metal is provided on a sample, and an alternating current is superimposed on a coil.
CONSTITUTION: A strong ECR plasma is generated in a part being closer to a microwave introducing part 2 than a sample 9 by an introduced microwave, a coil 8 and gas. A high-frequency wave is impressed between a first electrode 10 and a second electrode 11 by a high-frequency power source 12 and a matching unit 14 attached. Moreover, ions are moved in a lateral direction by superimposing an alternating current on the coil 8, so as to avoids transferring a shadow formed by a meshy metal provided in a part on the sample 9 onto the sample 9. According to this constitution, an AC voltage is impressed stably, effectively and without fluctuation and anisotropic plasma treatment is executed stably.
Inventors:
Tetsunori Kaji
Takashi Fujii
Motohiko Yoshikai
Yoshinao Kawasaki
Masaharu Saikai
Takashi Fujii
Motohiko Yoshikai
Yoshinao Kawasaki
Masaharu Saikai
Application Number:
JP15658196A
Publication Date:
September 25, 2001
Filing Date:
June 18, 1996
Export Citation:
Assignee:
株式会社日立製作所
日立テクノエンジニアリング株式会社
日立テクノエンジニアリング株式会社
International Classes:
H05H1/46; C23C14/35; C23C16/50; C23C16/507; C23C16/511; C23F4/00; C30B23/08; C30B25/02; H01L21/203; H01L21/205; H01L21/28; H01L21/285; H01L21/302; H01L21/3065; H01L21/31; (IPC1-7): H01L21/3065; C23C16/507; C23F4/00; H01L21/205; H01L21/31; H05H1/46
Domestic Patent References:
| JP2294483A | ||||
| JP1272769A | ||||
| JP58185773A | ||||
| JP60223126A | ||||
| JP2253617A | ||||
| JP6365623A | ||||
| JP271516A | ||||
| JP267632U |
Attorney, Agent or Firm:
Yasuo Sakuta