Title:
可視光応答性の光活性の被膜、被覆物品およびその製法
Document Type and Number:
Japanese Patent JP2005507974
Kind Code:
A
Abstract:
An article includes a substrate having an inner surface and an outer surface. A coating is deposited directly on at least a portion of the substrate outer surface. The coating consists essentially of titania and at least one additional photoabsorption band modifying material selected from vanadium (V), manganese (Mn), magnesium (Mg), scandium (Sc), yttrium (Y), niobium (Nb), molybdenum (Mo), ruthenium (Ru), lead (Pb), nickel (Ni), rhenium (Re), and mixtures thereof. The coating is a substantially non-porous CVD or MSVD coating and an outer surface of the coating is exposed to the environment.
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Inventors:
Greenberg, Charles, Bee
Suzanii, Janos
Suzanii, Janos
Application Number:
JP2003512167A
Publication Date:
March 24, 2005
Filing Date:
July 12, 2002
Export Citation:
Assignee:
PPG Industries Ohio,Inc.
International Classes:
B32B9/00; B01J35/02; B01J37/02; B01J37/34; C03B18/14; C03C17/00; C03C17/245; C03C17/25; C03C17/34; C23C14/48; C23C16/40; (IPC1-7): C23C16/40; B01J35/02; B01J37/02; B01J37/34; B32B9/00; C03B18/14; C23C14/48
Domestic Patent References:
| JPH11512337A | 1999-10-26 | |||
| JPH09262482A | 1997-10-07 | |||
| JP2000513695A | 2000-10-17 | |||
| JPS60500267A | 1985-02-28 | |||
| JPH09192496A | 1997-07-29 | |||
| JPH1190237A | 1999-04-06 |
Foreign References:
| WO2000018504A1 | 2000-04-06 |
Other References:
JPN6009048472; Ｙ．ＴＡＫＡＨＡＳＨＩ ｅｔ ａｌ．: 'Ｅｌｅｃｔｒｉｃａｌ ａｎｄ Ｅｌｅｃｔｒｏｃｈｅｍｉｃａｌ Ｐｒｏｐｅｒｔｉｅｓ ｏｆ ＴｉＯ２ Ｆｉｌｍｓ Ｇｒｏｗｎ ｂｙ Ｏｒｇａｎｏｍｅｔａｌｌｉｃ Ｃｈｅｍｉｃａｌ Ｖａｐｏｕｒ Ｄｅｐｏ' Ｊｏｕｒｎａｌ ｏｆ Ｃｈｅｍｉｃａｌ Ｓｏｃｉｅｔｙ Ｆａｒａｄａｙ Ｔｒａｎｓａｃｔｉｏｎｓ Ｉ Ｖｏｌ．７８, 1982, ｐ．２５６３-２５７１
JPN6009048475; ＳＡＲＡＨ Ｒ．ＫＵＲＴＺ ｅｔ ａｌ．: 'ＣＨＥＭＩＣＡＬ ＶＡＰＯＲ ＤＥＰＯＳＩＴＩＯＮ ＯＦ ＤＯＰＥＤ ＴｉＯ２ ＴＨＩＮ ＦＩＬＭＳ' Ｔｈｉｎ ｓｏｌｉｄ ｆｉｌｍｓ Ｖｏｌ．１４７, 1987, ｐ．１６７-１７６
JPN6009048474; Ｖ．ＧＡＵＴＨＩＥＲ ｅｔ ａｌ．: 'Ｇｒｏｗｔｈ ａｎｄ ｃｈａｒａｃｔｅｒｉｚａｔｉｏｎ ｏｆ ＡＰ-ＭＯＣＶＤ ｉｒｏｎ ｄｏｐｅｄ ｔｉｔａｎｉｕｍ ｄｉｏｘｉｄｅ ｔｈｉｎ ｆｉｌｍｓ' Ｔｈｉｎ ｓｏｌｉｄ ｆｉｌｍｓ Ｖｏｌ．３４０, 1999, ｐ．１７５-１８２
JPN6010047061; ＧＡＯ Ｙ， ＴＨＥＶＵＴＨＡＳＡＮ Ｓ， ＭＣＣＲＥＡＤＹ Ｄ Ｅ， ＥＮＧＥＬＨＡＲＤ Ｍ: 'ＭＯＣＶＤ ｇｒｏｗｔｈ ａｎｄ ｓｔｒｕｃｔｕｒｅ ｏｆ Ｎｂ- ａｎｄ Ｖ-ｄｏｐｅｄ ＴｉＯ２ ｆｉｌｍｓ ｏｎ ｓａｐｐｈｉｒｅ' Ｊ Ｃｒｙｓｔ Ｇｒｏｗｔｈ Ｖｏｌ．２１２ Ｎｏ．１／２, 200004, Ｐａｇｅ．１７８-１９０
JPN6012049849; Ｈｉｔｏｓｈｉ ＮＡＩＴＯ ａｎｄ Ｈａｒｕｏ ＡＲＡＳＨＩ: 'Ｔｈｉｎ ｆｉｌｍｓ ｆａｂｒｉｃａｔｉｏｎ ｏｆ ＺｒＯ２-ＴｉＯ２-Ｙ２０３ ｂｙ ｌａｓｅｒ ＣＶＤ ａｎｄ ｔｈｅｉｒ ｅｌｅｃｔｒｉｃａｌ ｐｒｏｐｅｒｔｉｅｓ' Ｓｏｌｉｄ Ｓｔａｔｅ Ｉｏｎｉｃｓ Ｖｏｌ．６７, 1994, ｐｐ．１９７-２０１
JPN6009048475; ＳＡＲＡＨ Ｒ．ＫＵＲＴＺ ｅｔ ａｌ．: 'ＣＨＥＭＩＣＡＬ ＶＡＰＯＲ ＤＥＰＯＳＩＴＩＯＮ ＯＦ ＤＯＰＥＤ ＴｉＯ２ ＴＨＩＮ ＦＩＬＭＳ' Ｔｈｉｎ ｓｏｌｉｄ ｆｉｌｍｓ Ｖｏｌ．１４７, 1987, ｐ．１６７-１７６
JPN6009048474; Ｖ．ＧＡＵＴＨＩＥＲ ｅｔ ａｌ．: 'Ｇｒｏｗｔｈ ａｎｄ ｃｈａｒａｃｔｅｒｉｚａｔｉｏｎ ｏｆ ＡＰ-ＭＯＣＶＤ ｉｒｏｎ ｄｏｐｅｄ ｔｉｔａｎｉｕｍ ｄｉｏｘｉｄｅ ｔｈｉｎ ｆｉｌｍｓ' Ｔｈｉｎ ｓｏｌｉｄ ｆｉｌｍｓ Ｖｏｌ．３４０, 1999, ｐ．１７５-１８２
JPN6010047061; ＧＡＯ Ｙ， ＴＨＥＶＵＴＨＡＳＡＮ Ｓ， ＭＣＣＲＥＡＤＹ Ｄ Ｅ， ＥＮＧＥＬＨＡＲＤ Ｍ: 'ＭＯＣＶＤ ｇｒｏｗｔｈ ａｎｄ ｓｔｒｕｃｔｕｒｅ ｏｆ Ｎｂ- ａｎｄ Ｖ-ｄｏｐｅｄ ＴｉＯ２ ｆｉｌｍｓ ｏｎ ｓａｐｐｈｉｒｅ' Ｊ Ｃｒｙｓｔ Ｇｒｏｗｔｈ Ｖｏｌ．２１２ Ｎｏ．１／２, 200004, Ｐａｇｅ．１７８-１９０
JPN6012049849; Ｈｉｔｏｓｈｉ ＮＡＩＴＯ ａｎｄ Ｈａｒｕｏ ＡＲＡＳＨＩ: 'Ｔｈｉｎ ｆｉｌｍｓ ｆａｂｒｉｃａｔｉｏｎ ｏｆ ＺｒＯ２-ＴｉＯ２-Ｙ２０３ ｂｙ ｌａｓｅｒ ＣＶＤ ａｎｄ ｔｈｅｉｒ ｅｌｅｃｔｒｉｃａｌ ｐｒｏｐｅｒｔｉｅｓ' Ｓｏｌｉｄ Ｓｔａｔｅ Ｉｏｎｉｃｓ Ｖｏｌ．６７, 1994, ｐｐ．１９７-２０１
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Yukihiro Ikeda
Kajiwara Saiko
Hajime Asamura
Yukihiro Ikeda
Kajiwara Saiko