Title:
VACUUM FILM DEPOSITION DEVICE AND VACUUM FILM DEPOSITION METHOD
Document Type and Number:
Japanese Patent JP2017101282
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a vacuum film deposition device (a film deposition method) which prevents film wrinkle generation, even if thermal load acting on a long resin film with heat resistance is increased.SOLUTION: In the vacuum film deposition device (method) which includes a cooling can roll 56, a magnetron sputtering cathode (film deposition means) 57 to 60 with the thermal load, arranged along an outer circumference face of the cooling can roll, and a front feed roll 55, and which deposits film on a surface side of a long resin film 52, while the long resin film transported by roll-to-roll is rolled to the cooling can roll via the front feed roll, the outer circumference face of the cooling can roll 56 is formed in a crown form in which both axis direction edge parts are lower than the axis direction center part, and a nip roll 65 which is controlled so as to contact/be separate with/from the outer circumference face of the front feel roll 55 is provided.SELECTED DRAWING: Figure 3
Inventors:
OGAMI HIDEHARU
Application Number:
JP2015234948A
Publication Date:
June 08, 2017
Filing Date:
December 01, 2015
Export Citation:
Assignee:
SUMITOMO METAL MINING CO
International Classes:
C23C14/56; C23C14/14; C23C14/20; C23C14/34
Domestic Patent References:
| JPH07243042A | 1995-09-19 | |||
| JP2013237896A | 2013-11-28 |
Attorney, Agent or Firm:
Akira Ueda
Masahiro Koizumi
Masahiro Koizumi