Title:
Wafer holding equipment and wafer processing equipment
Document Type and Number:
Japanese Patent JP6322255
Kind Code:
B2
Abstract:
The present invention provides a wafer supporting device capable of preventing the invasion of chemical liquid into a table and preventing the sputtering caused by wafer slip. The wafer supporting device supports a wafer horizontally and rotates the wafer. The wafer supporting device comprises: a table composed of an upper table and a main body of table that supports the upper table; a plurality of clamp pins allocated on the upper surface of the upper table in a way of surrounding the wafer, and supporting the wafer from the lateral side; and a table support shaft. The clamp pins are eccentrically arranged with respect to the rotation axis and stands on a rotatable clamp follower portion, the clamp follower portion is received inside the upper table, a magnet is received inside the clamp follower portion. The clamp driving portion is received in a non-contact manner with the clamp follower portion at a corresponding position below the clamp follower portion in the main body of table.
Inventors:
Tetsuji Koga
Yasuyuki Harada
Yasuyuki Harada
Application Number:
JP2016207021A
Publication Date:
May 09, 2018
Filing Date:
October 21, 2016
Export Citation:
Assignee:
Pretec Co., Ltd.
Techno Design Co., Ltd.
Techno Design Co., Ltd.
International Classes:
H01L21/683; H01L21/304
Domestic Patent References:
| JP2010073825A | ||||
| JP11233474A | ||||
| JP2003282678A | ||||
| JP2014212338A | ||||
| JP2002367947A | ||||
| JP2001250859A | ||||
| JP7272993A | ||||
| JP2015088736A |
Foreign References:
| US20140097580 |
Attorney, Agent or Firm:
Mikio Yoshimiya
Toshihiro Kobayashi
Toshihiro Kobayashi
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