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Patent Searching and Data


Title:
3D-MODELING DEVICE, 3D-MODELING DEVICE CONTROL METHOD AND 3D-MODELING DEVICE CONTROL PROGRAM
Document Type and Number:
WIPO Patent Application WO/2017/126073
Kind Code:
A1
Abstract:
The objective of the present invention is to prevent excessive evaporation of a powder in a 3D-modeling device wherein an electron beam scans the powder. The 3D-modeling device (100) comprises: a main deflector (103) causing an electron beam (107) to be deflected; an auxiliary deflector (108) causing the electron beam (107) to be deflected, and having a narrower deflection range and a faster scanning speed than the main deflector (103); and control means (112, 113) for controlling the deflection directions and the scanning speeds of the main deflector (103) and the auxiliary deflector (108). The main deflector (103) moves the deflection range of the auxiliary deflector (108). Within the deflection range, the auxiliary deflector (108) scans and irradiates a sub-region multiple times distributed over a predetermined number of times, the sub-region being the region to be scanned and irradiated by the electron beam (107).

Inventors:
GOTO KAZUYA (JP)
Application Number:
PCT/JP2016/051656
Publication Date:
July 27, 2017
Filing Date:
January 21, 2016
Export Citation:
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Assignee:
FUTURE ADDITIVE MFG TECH RES ASS (JP)
International Classes:
H01J37/30; B22F3/105; B22F3/16; H01J37/305
Foreign References:
US20050186538A12005-08-25
JPH1032188A1998-02-03
JP2003531034A2003-10-21
Other References:
See also references of EP 3223299A4
Attorney, Agent or Firm:
KATO Takashi et al. (JP)
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