Title:
ABERRATION CORRECTION DEVICE AND CHARGED-PARTICLE BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/021455
Kind Code:
A1
Abstract:
The objective of the present invention is to achieve to a high degree the correction of chromatic aberration, spherical aberration, or both using simple configuration and adjustment. Provided for this purpose is the aberration correction device disposed together with an optical element to be corrected along the optical axis of the charged particle beam, characterized by comprising 2n (n≥2) poles and an opening-forming member having an opening for the charged particle beam to pass through, wherein the opening is formed so as to be comparatively longer in a first direction (such as 0-degree direction) than a second direction (such as 45-degree direction) that is orthogonal to the optical axis, the first direction being orthogonal to the optical axis while being different from the second direction, and the first direction further being a direction along which the aberration generated by operating the aberration correction device cancels out the aberration generated by said optical element to be corrected.
Inventors:
KURODA KOICHI (JP)
BLACKBURN ARTHUR MALCOLM (GB)
SASAKI TOMOYO (JP)
DOHI HIDETO (JP)
BLACKBURN ARTHUR MALCOLM (GB)
SASAKI TOMOYO (JP)
DOHI HIDETO (JP)
Application Number:
PCT/JP2017/027414
Publication Date:
January 31, 2019
Filing Date:
July 28, 2017
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/153
Domestic Patent References:
| WO2010035386A1 | 2010-04-01 |
Foreign References:
| JP2004134389A | 2004-04-30 | |||
| JP2006147520A | 2006-06-08 | |||
| JP2015207351A | 2015-11-19 |
Attorney, Agent or Firm:
IWASAKI Shigemi (JP)
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