Title:
ABERRATION CORRECTION DEVICE AND ELECTRON MICROSCOPE
Document Type and Number:
WIPO Patent Application WO/2022/153367
Kind Code:
A1
Abstract:
The present invention provides an aberration correction device comprising first and second multipoles forming a hexapole field and transfer optics formed from a plurality of round lenses, wherein the transfer optics are disposed between the first and second multipoles and act on charged particle beams such that the absolute value of the inclination of a charged particle beam passing through the first multipole is different from the absolute value of the inclination of a charged particle beam passing through the second multipole.
Inventors:
TAMAKI HIROKAZU (JP)
KUBO YUDAI (JP)
KUBO YUDAI (JP)
Application Number:
PCT/JP2021/000704
Publication Date:
July 21, 2022
Filing Date:
January 12, 2021
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/147
Domestic Patent References:
| WO2019231908A1 | 2019-12-05 |
Foreign References:
| JP2012234755A | 2012-11-29 | |||
| JP2012109076A | 2012-06-07 | |||
| JP2019129073A | 2019-08-01 | |||
| JP2019179650A | 2019-10-17 | |||
| JP2008124001A | 2008-05-29 |
Attorney, Agent or Firm:
TOU-OU PATENT FIRM (JP)
Download PDF:
Previous Patent: MAGNETIC ARRAY, CONTROL METHOD FOR MAGNETIC ARRAY, AND CONTROL PROGRAM FOR MAGNETIC ARRAY
Next Patent: MOVING BODY
Next Patent: MOVING BODY