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Title:
ABNORMALITY DETECTION DEVICE FOR CHEMICALS, LIQUID PROCESSING DEVICE, SUBSTRATE PROCESSING DEVICE, ABNORMALITY DETECTION METHOD FOR CHEMICALS, LIQUID PROCESSING METHOD, AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/202962
Kind Code:
A1
Abstract:
[Problem] To prevent, when feeding a chemical to a body to be processed and processing the body to be processed, an abnormality from occurring in the processing, and detect whether or not a polymer-containing chemical in a chemical flow path is present at a desired proportion relative to another chemical. [Solution] A device is configured so as to be provided with: a chemical flow path channelling a polymer-containing chemical; a laser light beaming unit for beaming laser light at the chemical flow path so that the light path and the direction of chemical flow in the chemical flow path intersect; a light-receiving element provided on the light path after having passed through the chemical flow path; and a detection unit for detecting the proportion between the polymer-containing chemical and another chemical in the chemical flow path, or detecting an abnormality in the state of a polymer representing more than half of the polymers contained in the chemical, on the basis of a signal outputted from the light-receiving element.

Inventors:
HAYASHI MASATO (JP)
MORI TAKUYA (JP)
SHITE HIDEO (JP)
SAKAMOTO HIROKAZU (JP)
Application Number:
PCT/JP2019/014495
Publication Date:
October 24, 2019
Filing Date:
April 01, 2019
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/027; B05C9/14; B05C11/00; B05C11/08; B05C11/10; B05D1/40; B05D3/00; B05D3/06
Foreign References:
JP2001340800A2001-12-11
JP2003100615A2003-04-04
JP2008066520A2008-03-21
JP2016225574A2016-12-28
Attorney, Agent or Firm:
YAYOY PATENT OFFICE (JP)
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