Title:
ABSORPTIVE DEFECT SINGLE-BEAM PHOTOTHERMAL MEASUREMENT DEVICE AND MEASUREMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2021/227134
Kind Code:
A1
Abstract:
An absorptive defect single-beam photothermal measurement device and measurement method. The device comprises common-optical-path and non-common-optical-path structures. According to the present invention, the optical path structure is simple and it is convenient to install and debug. The measurement result is stable, and a measurement signal anomaly caused by environmental vibration and sample inclination is avoided. By detecting power change of a light beam at the edge of a light spot, system measurement sensitivity is significantly improved.
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Inventors:
LIU SHIJIE (CN)
NI KAIZAO (CN)
SHAO JIANDA (CN)
WANG WEIWEI (CN)
XU TIANZHU (CN)
LI YING JIA (CN)
LU QI (CN)
NI KAIZAO (CN)
SHAO JIANDA (CN)
WANG WEIWEI (CN)
XU TIANZHU (CN)
LI YING JIA (CN)
LU QI (CN)
Application Number:
PCT/CN2020/092785
Publication Date:
November 18, 2021
Filing Date:
May 28, 2020
Export Citation:
Assignee:
SHANGHAI INST OPTICS & FINE MECH CAS (CN)
SHANGHAI HENGYI OPTICS AND FINE MECH CO LTD (CN)
SHANGHAI HENGYI OPTICS AND FINE MECH CO LTD (CN)
International Classes:
G01N21/95; G01N21/17; G01N21/896
Foreign References:
| CN101082537A | 2007-12-05 | |||
| CN106769881A | 2017-05-31 | |||
| CN111122599A | 2020-05-08 | |||
| US8264693B2 | 2012-09-11 |
Attorney, Agent or Firm:
SHANGHAI HENGHUI INTELLECTUAL PROPERTY AGENCY (CN)
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