ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF

WIPO Patent Application WO2003099782

A3

A polymer comprises an acetal-containing monomer unit having the general structure (I) and at least one of the fluorine-containing monomer units having the general structures (II) and (III) wherein R<1>, R<4>, R<5> and R<6> are each independently H, lower alkyl, CH2CO2R10, cyano, CH2CN, or halogen, wherein R<10> is any alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl or siloxy or linear or cyclic polysiloxane group; R<2 >is CHR<11>R<12> where R<11> and R<12> are each independently H, lower alkyl, cycloalkyl or aryl; A is a substituted or unsubstituted alkylene, cycloalkylene, alkylenecycloalkylene, or alkylenearylene; and R<3> is linear, branched or cyclic fluoroalkyl group or SiR<13>R<14>R<15 >where R<13>, R<14>, and R<15> are each independently alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl, siloxy, linear or cyclic polysiloxane or silsesquioxane alkyl group; B is an aryl, C(=O)-O-(CH2)X where x=0-4, lower alkyl, cycloalkyl, alkene cycloalkyl, silyl, siloxyl, or linear or cyclic polysiloxane group. R<7> is H or an acid sensitive group; R<8> and R<9> are each independently H or -CN group; and y=0-4 and the use of these polymers in radiation sensitive compositions for exposure to actinic radiation, especially radiation of 157 nm.

MALIK SANJAY
DILOCKER STEPHANIE J
DE BINOD B

PCT/US2003/016765

February 26, 2004

May 28, 2003

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ARCH SPEC CHEM INC (US)

C08F2/54; C08F8/00; C08F212/14; C08F232/08; C08K3/00; G03F7/004; G03F7/039; G03F7/075; H01L21/027; (IPC1-7): G03F7/004; C08F30/08

US20030065101A1	2003-04-03
US6380317B1	2002-04-30
US5891603A	1999-04-06
US20030134225A1	2003-07-17
US6207343B1	2001-03-27

See also references of EP 1509814A4

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