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Patent Searching and Data


Title:
ACETAL-PROTECTED SILANOL GROUP-CONTAINING POLYSILOXANE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2018/043407
Kind Code:
A1
Abstract:
[Problem] To provide a composition containing an acetal-protected polysiloxane, which is able to be used as a photosensitive composition or a coating composition for forming a flat film on a substrate to be processed for performing pattern reversal. [Solution] A coating composition or photosensitive composition which contains a polysiloxane that is obtained from a hydrolysis-condensation product of a hydrolyzable silane having 2 to 4 hydrolyzable groups in each molecule by acetal-protecting a silanol group of the hydrolysis-condensation product, and wherein the hydrolysis-condensation product contains an organic group at a molar ratio satisfying 0 ≤ (organic group)/(Si) ≤ 0.29 on average, said organic group being bonded to a silicon atom by means of an Si-C bond. A method for manufacturing a semiconductor device, which comprises: a step (A) for forming a resist film on a semiconductor substrate; a step (B) for obtaining a resist pattern by exposing the resist film to light and by developing the resist after the light exposure; a step (C) for embedding a polysiloxane in the patterned resist film by applying a coating composition of the present invention thereto; a step (D) for reversing the pattern by etching the resist film after curing the embedded polysiloxane; and a step (E) for processing the substrate with use of the polysiloxane film.

Inventors:
ENDO YUKI (JP)
YAGUCHI HIROAKI (JP)
NAKAJIMA MAKOTO (JP)
Application Number:
PCT/JP2017/030753
Publication Date:
March 08, 2018
Filing Date:
August 28, 2017
Export Citation:
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Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
C09D183/04; C08G77/38; G03F7/038; G03F7/075; G03F7/40
Domestic Patent References:
WO2016052390A12016-04-07
Foreign References:
JP2009263522A2009-11-12
JP2002082437A2002-03-22
JPH11130860A1999-05-18
JP2004212946A2004-07-29
JPH04345841A1992-12-01
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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