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Title:
ACRYLONITRILE-BUTADIENE-STYRENE COPOLYMER TRANSPARENT RESIN HAVING SUPERIOR CHEMICAL RESISTANCE AND TRANSPARENCY AND PREPARTION THEREOF
Document Type and Number:
WIPO Patent Application WO2003037977
Kind Code:
A3
Abstract:
The present invention relates to acrylonitrile-butadiene-styrene copolymer transparent resin having superior chemical resistance and transparency and preparation thereof, and particularly to acrylonitrile-butadiene-styrene copolymer transparent resin having superior chemical resistance and transparency by graft-copolymerzing on a) conjugated diene rubber latex, b) methacrylate alkylester or acrylate alkylester compound, c) aromatic vinyl compound and d) vinyl cyanide compound, and preparation thereof. In addition, according to the present invention, chemical resistance and ESCR can be further improved by further adding e) polyester-amide copolymer to the acrylonitrile-butadiene-styrene copolymer transparent resin.

Inventors:
CHOI JEONG-SU (KR)
KIM SUNG-HEE (KR)
BAHN HYOUNG-MIN (KR)
YOO KEUN-HOON (KR)
Application Number:
PCT/KR2002/001985
Publication Date:
December 18, 2003
Filing Date:
October 24, 2002
Export Citation:
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Assignee:
LG CHEMICAL LTD (KR)
CHOI JEONG-SU (KR)
KIM SUNG-HEE (KR)
BAHN HYOUNG-MIN (KR)
YOO KEUN-HOON (KR)
International Classes:
C08F2/00; C08F2/02; C08F2/22; C08F279/02; C08L51/04; C08L55/02; (IPC1-7): C08F279/02; C08F2/02; C08F2/22; C08L55/00; C08L77/12
Foreign References:
GB2092604A1982-08-18
US5166261A1992-11-24
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