Title:
ACTINIC ENERGY RADIATION NEGATIVE-WORKING PHOTORESIST COMPOSITION AND CURED PRODUCT THEREOF
Document Type and Number:
WIPO Patent Application WO/2007/119391
Kind Code:
A1
Abstract:
Disclosed is an actinic energy radiation negative-working photoresist composition that
is free from any toxic element, has good thermal stability, and has excellent resolution.
The composition comprises a salt of an oniumfluorinated alkylfluorophosphoric acid,
as a cation polymerization initiator represented by formula (4), wherein A represents
a group VIA or VIIA (CAS notation) element having a valence of m; m = 1 to 2, n = 0 to
3, R represents an organic group, D represents a formula (5), E represents a group
having a divalent group, G represents -O-, -S-, -SO-, -SO2-, -NH-,
-NR'-, -CO-, -COO-, -CONH, an alkylene having 1 to 3 carbon atoms or phenylene,
a = 0 to 5, X- represents a formula (6), Rf represents an alkyl in which
not less than 80% of hydrogen atoms have been substituted by a fluorine atom, and
b = 1 to 5. The composition further comprises a cation-polymerizable compound,
and a solvent.
Inventors:
KIMURA HIDEKI (JP)
DATE MASASHI (JP)
DATE MASASHI (JP)
Application Number:
PCT/JP2007/055350
Publication Date:
October 25, 2007
Filing Date:
March 16, 2007
Export Citation:
Assignee:
SAN APRO LTD (JP)
KIMURA HIDEKI (JP)
DATE MASASHI (JP)
KIMURA HIDEKI (JP)
DATE MASASHI (JP)
International Classes:
G03F7/029; G03F7/004; G03F7/038; H01L21/027
Domestic Patent References:
| WO2005116038A1 | 2005-12-08 |
Foreign References:
| JPH05188593A | 1993-07-30 |
Attorney, Agent or Firm:
HAYASAKA, Takumi (2nd Fl. Kitahama-heiwa Bldg., 5-13, Kitahama 2-chome, Chuo-k, Osaka-shi Osaka 41, JP)
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