ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIST FILM, MASK BLANK, RESIST PATTERN-FORMING METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD ALL USING SAID COMPOSITION

Title:

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIST FILM, MASK BLANK, RESIST PATTERN-FORMING METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD ALL USING SAID COMPOSITION

Document Type and Number:

WIPO Patent Application WO/2016/056418

Kind Code:

A1

Abstract:

　Provided is an actinic ray-sensitive or radiation-sensitive composition comprising a compound (A) including an acid crosslinking group and a transition metal atom, and having a molecular mass of at most 1000. When used for the formation of micropatterns (e.g. line patterns having a linewidth of at most 50nm), the actinic ray-sensitive or radiation-sensitive resin composition exhibits all of the following at a high level: high sensitivity, high resolving power, excellent pattern shape, excellent roughness performance, good etching resistance, and excellent scum performance. Further provided are a resist film, mask blank, resist pattern-forming method, and electronic device production method all using said composition.

Inventors:

TSUCHIMURA TOMOTAKA (JP)

Application Number:

PCT/JP2015/077292

Publication Date:

April 14, 2016

Filing Date:

September 28, 2015

Export Citation:

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Assignee:

FUJIFILM CORP (JP)

International Classes:

G03F7/004; C07F17/00; C07F17/02; G03F7/038

Foreign References:

JP2011530652A	2011-12-22
JPH09230587A	1997-09-05
JP2014071305A	2014-04-21
US3147285A	1964-09-01
JPS62178244A	1987-08-05
JP2001072716A	2001-03-21