Title:
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN-FORMING METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2016/006489
Kind Code:
A1
Abstract:
Provided are an actinic ray-sensitive or radiation-sensitive resin composition having a large depth of focus and excellent line width roughness, a pattern-forming method using said composition, and an electronic device production method. The actinic ray-sensitive or radiation-sensitive resin composition comprises a resin (P) containing: a repeat unit (a) that comprises at least a specific repeat unit (a1) represented by general formula (1), and that has a group that is decomposed by the action of an acid to generate a polar group; a repeat unit (b1) that has at least a lactone structure, a sultone structure or a carbonate structure; a repeat unit (b2) that is different to the repeat unit (b1) and that has at least a lactone structure, a sultone structure or a carbonate structure. The Ohnishi parameter of the repeat unit (b1) is larger that the Ohnishi parameter of the repeat unit (b2), and the difference between both is at least 0.85.
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Inventors:
GOTO AKIYOSHI (JP)
KOJIMA MASAFUMI (JP)
SHIRAKAWA MICHIHIRO (JP)
KATO KEITA (JP)
KOJIMA MASAFUMI (JP)
SHIRAKAWA MICHIHIRO (JP)
KATO KEITA (JP)
Application Number:
PCT/JP2015/068680
Publication Date:
January 14, 2016
Filing Date:
June 29, 2015
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/038; C08F220/18; G03F7/039
Domestic Patent References:
| WO2013133230A1 | 2013-09-12 |
Foreign References:
| JP2012220824A | 2012-11-12 | |||
| JP2013235115A | 2013-11-21 | |||
| JP2015096911A | 2015-05-21 | |||
| JP2014170167A | 2014-09-18 | |||
| JP2014142424A | 2014-08-07 | |||
| JP2012137518A | 2012-07-19 |
Attorney, Agent or Firm:
WATANABE Mochitoshi et al. (JP)
Mochitoshi Watanabe (JP)
Mochitoshi Watanabe (JP)
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