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Title:
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, RESIST FILM-EQUIPPED MASK BLANK, PATTERN-FORMING METHOD FOR RESIST FILM-EQUIPPED MASK BLANK
Document Type and Number:
WIPO Patent Application WO/2019/039290
Kind Code:
A1
Abstract:
Provided are: an actinic ray-sensitive or radiation-sensitive resin composition that has excellent resolution, exposure latitude, and pattern shape properties; and a resist film, a pattern-forming method, a method for producing an electronic device, a resist film-equipped mask blank, and a pattern-forming method for a resist film-equipped mask blank, which use said actinic ray-sensitive or radiation-sensitive resin composition. This actinic ray-sensitive or radiation-sensitive resin composition comprises: a compound that generates an acid represented by specific general formula (I) upon being irradiated with an actinic ray or radiation; and a resin.

Inventors:
TSUCHIMURA TOMOTAKA (JP)
YAGI KAZUNARI (JP)
Application Number:
JP2018/029765
Publication Date:
February 28, 2019
Filing Date:
August 08, 2018
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; C07C381/12; C07D231/54; C07D265/10; C07D275/04; C07D281/18; C07D309/08; C07D319/06; C07D327/08; C07D333/42; C07D333/46; C07D333/76; C07D335/02; C07D493/04; C07D493/08; C08K5/42; C08L101/00; G03F1/82; G03F7/038; G03F7/039; G03F7/20; C09K3/00
Domestic Patent References:
WO2013140969A12013-09-26
Foreign References:
JP2014224984A2014-12-04
JP2012133055A2012-07-12
JP2017156727A2017-09-07
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (JP)
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