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Title:
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE MANUFACTURE METHOD
Document Type and Number:
WIPO Patent Application WO/2020/044771
Kind Code:
A1
Abstract:
Provided is an actinic-ray-sensitive or radiation-sensitive resin composition from which a pattern having excellent LWR performance can be produced. Also provided are a resist film, a pattern formation method and an electronic device manufacture method, each of which is associated with the actinic-ray-sensitive or radiation-sensitive resin composition. The actinic-ray-sensitive or radiation-sensitive resin composition comprises at least one component selected from the group consisting of a photo-acid generator A capable of generating an acid represented by general formula (I) and having a pKa value of -1.00 or more, a photo-acid generator B capable of generating an acid having a pKa value larger by 1.00 or more than that of the acid generated from the photo-acid generator A, and a nitrogenated compound C of which a conjugate acid has a pKa value that is larger by 1.00 or more than that of the acid generated from the photo-acid generator A, and an acid-degradable resin, wherein, when a photo-acid generator D capable of generating an acid having a pKa value of less than -1.00 is contained, the ratio of the number of moles of the contained photo-acid generator A to the number of moles of the contained photo-acid generator D is 1.0 or more.

Inventors:
KOJIMA MASAFUMI (JP)
UEMURA MINORU (JP)
KAWASHIMA TAKASHI (JP)
GOTO AKIYOSHI (JP)
YAMAMOTO KEI (JP)
MARUMO KAZUHIRO (JP)
O KEIYU (JP)
Application Number:
JP2019/026029
Publication Date:
March 05, 2020
Filing Date:
July 01, 2019
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; C07C309/07; C07C309/09; C07C381/12; C09K3/00; G03F7/038; G03F7/039; G03F7/20; C07D235/18; C07D307/00; C07D307/33; C07D327/06
Domestic Patent References:
WO2017122528A12017-07-20
WO2018116916A12018-06-28
WO2018101339A12018-06-07
Foreign References:
JP2017197489A2017-11-02
JP2016206586A2016-12-08
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (JP)
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