Title:
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/024928
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing an actinic-ray-sensitive or radiation-sensitive resin composition capable of forming patterns having excellent LWR performance. Also provided are a resist film, a pattern formation method, and a method for producing an electronic device, which each relate to the actinic-ray-sensitive or radiation-sensitive resin composition. This actinic-ray-sensitive or radiation-sensitive resin composition comprises: an acid-decomposable resin including repeating units each having an acid-decomposable group comprising an acid group having a pKa of 13 or less protected by a leaving group which is eliminated by the action of an acid; and one or more compounds selected from among compounds (I) and (II) which generate an acid upon irradiation with actinic rays or radiation. The content of the acid-decomposable resin is 10 mass% or higher with respect to all the solid components of the composition. The content of the compounds generating an acid upon irradiation with actinic rays or radiation is 10 mass% or higher with respect to all the solid components of the composition. The acid-decomposable resin has halogen atoms in repeating units other than the repeating units having a group which generates an acid upon irradiation with actinic rays or radiation.
Inventors:
SHIRAKAWA MICHIHIRO (JP)
GOTO AKIYOSHI (JP)
GOTO AKIYOSHI (JP)
Application Number:
PCT/JP2021/027362
Publication Date:
February 03, 2022
Filing Date:
July 21, 2021
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C07D317/44; C07D295/096; C07D295/26; C07D307/32; C07D327/06; C07D333/08; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Foreign References:
| JP2014149409A | 2014-08-21 | |||
| JP2015024989A | 2015-02-05 | |||
| JP2009501207A | 2009-01-15 | |||
| JP2018058824A | 2018-04-12 | |||
| JP2019156830A | 2019-09-19 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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