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Title:
ACTIVATION CHAMBER AND KIT USED IN TREATMENT DEVICE FOR LOWERING ELECTRON AFFINITY, TREATMENT DEVICE THAT CONTAINS SAID KIT AND IS USED TO LOWER ELECTRONIC AFFINITY, PHOTOCATHODE ELECTRON-BEAM SOURCE, ELECTRON GUN CONTAINING PHOTOCATHODE ELECTRON-BEAM SOURCE, FREE-ELECTRON LASER ACCELERATOR, TRANSMISSION ELECTRON MICROSCOPE, SCANNING ELECTRON MICROSCOPE, ELECTRON-BEAM HOLOGRAPHY MICROSCOPE, ELECTRON-BEAM LITHOGRAPHY DEVICE, ELECTRON-BEAM DIFFRACTION DEVICE, AND ELECTRON-BEAM SCANNING DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/008561
Kind Code:
A1
Abstract:
This invention provides a treatment device for lowering electron affinity, said treatment device being capable of performing an EA surface treatment on a photocathode material or an EA surface retreatment on a photocathode, and an electron-beam device provided with said treatment device. An activation chamber (20) used in a treatment device for lowering electron affinity by vaporizing a surface-treatment material (30) and using the vaporized surface-treatment material (30) to perform an electron-affinity lowering treatment on a photocathode material (52) or an electron-affinity lowering retreatment on a photocathode (52), said activation chamber (20) being characterized by containing holes through which electrons can pass.

Inventors:
NISHITANI Tomohiro (1 Furo-cho, Chikusa-ku, Nagoya-sh, Aichi 01, 〒4648601, JP)
Application Number:
JP2014/065606
Publication Date:
January 22, 2015
Filing Date:
June 12, 2014
Export Citation:
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Assignee:
NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY (1 Furo-cho, Chikusa-ku Nagoya-sh, Aichi 01, 〒4648601, JP)
International Classes:
H01J37/073; H01J1/34; H01J9/12
Foreign References:
JPH09298032A1997-11-18
JP2002008575A2002-01-11
JP2009266809A2009-11-12
JP2010182466A2010-08-19
Other References:
See also references of EP 3024012A4
MRS-J NEWS, vol. 20, no. 2, May 2008 (2008-05-01)
Attorney, Agent or Firm:
MATSUMOTO Seiji (Aios Gotanda Ekimae Bldg. 411, 11-1 Nishigotanda 1-chome, Shinagawa-k, Tokyo 31, 〒1410031, JP)
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