Title:
ACTIVE ENERGY RAY CURABLE COMPOSITION FOR PHOTORESISTS
Document Type and Number:
WIPO Patent Application WO/2017/038329
Kind Code:
A1
Abstract:
Provided is an active energy ray curable composition for photoresists, which has excellent heating stability and exhibits good curability when cured.
An active energy ray curable composition for photoresists, which contains an acrylic copolymer resin (A), an acrylic copolymer resin (B) and a photopolymerization initiator (C), and wherein: the acrylic copolymer resin (A) has a (meth)acryloyl group and a carboxyl group in side chains; and the acrylic copolymer resin (B) has a (meth)acryloyl group and a carboxyl group in side chains, while having a resin skeleton which is different from that of the acrylic copolymer resin (A).
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Inventors:
SAGAMI TAKAO (JP)
Application Number:
PCT/JP2016/072180
Publication Date:
March 09, 2017
Filing Date:
July 28, 2016
Export Citation:
Assignee:
DAICEL-ALLNEX LTD (JP)
International Classes:
G03F7/038
Foreign References:
JP2003207890A | 2003-07-25 | |||
JP2011138037A | 2011-07-14 | |||
JPH04270345A | 1992-09-25 | |||
JP2010250127A | 2010-11-04 |
Attorney, Agent or Firm:
GOTO & CO. (JP)
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