Title:
ACTIVE ENERGY RAY-CURABLE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2019/116931
Kind Code:
A1
Abstract:
The present invention provides an active energy ray-curable composition which contains a highly reactive anionically polymerizable compound and a photobase generator, has excellent storage stability prior to being irradiated with active energy rays, and exhibits high photopolymerization reactivity upon being irradiated with active energy rays. The present invention pertains to an active energy ray-curable composition containing an anionically polymerizable compound represented by general formula (1) and a compound (photobase generator) represented by general formula (2). In formula (1), EWG represents an electron-withdrawing group, X represents a single bond or an oxygen atom (-O-), R represents an n-valent organic group, and n represents an integer of 1-6. When n is an integer of 2-6, EWG and X may be identical of different. When n is 1, EWG and R may be bonded. In formula (2), ring A represents an aromatic or heteroaromatic ring which may have a substituent, R1 and R2 are identical or different and represent a hydrogen atom or an alkyl group, R1 and R2 may bond with each other to form a ring together with an adjacent nitrogen atom, and the ring may have a substituent.
Inventors:
ARIMITSU KOJI (JP)
OOMURA KENTO (JP)
OOMURA KENTO (JP)
Application Number:
PCT/JP2018/044205
Publication Date:
June 20, 2019
Filing Date:
November 30, 2018
Export Citation:
Assignee:
UNIV TOKYO SCIENCE FOUND (JP)
TOAGOSEI CO LTD (JP)
TOAGOSEI CO LTD (JP)
International Classes:
C08F20/26; C09D4/00; C09D4/02; C09D4/04; C09D7/63; C09D11/101; C09J4/00; C09J4/02; C09J4/04; C09J11/06; C09K3/00
Domestic Patent References:
| WO2016052493A1 | 2016-04-07 | |||
| WO2017151711A1 | 2017-09-08 |
Foreign References:
| JP2015512460A | 2015-04-27 | |||
| JP2017155204A | 2017-09-07 | |||
| JP2013216728A | 2013-10-24 | |||
| JP2012250969A | 2012-12-20 | |||
| JP2013227496A | 2013-11-07 | |||
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| JP2011080032A | 2011-04-21 | |||
| JP5561693B2 | 2014-07-30 | |||
| JP2012250969A | 2012-12-20 | |||
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| JP2013216728A | 2013-10-24 | |||
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| JP2015512460A | 2015-04-27 | |||
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Other References:
KEIJIRO OHBORA, MASAHIRO FURUTANI, KOJI ARIMITSU: "Development of novel photobase generators using photocyclization and its application to photoreactive materials", POLYMER PREPRINTS, JAPAN, vol. 65, no. 2, 2016, JP, pages 1 - 2, XP009521573
POLYMER PREPRINTS, vol. 65, no. 2, 2016
JOURNAL OF THE CHEMICAL SOCIETY, CHEMICAL COMMUNICATIONS, no. 7, 1993, pages 598 - 599
JOURNAL OF THE CHEMICAL SOCIETY OF JAPAN, no. 3, 1972, pages 596 - 598
JOURNAL OF THE CHEMICAL SOCIETY OF JAPAN, vol. 56, no. 11, 1953, pages 81 - 83
J. CHEM. SOC., PERKIN TRANS. I, pages 344 - 348
See also references of EP 3725815A4
POLYMER PREPRINTS, vol. 65, no. 2, 2016
JOURNAL OF THE CHEMICAL SOCIETY, CHEMICAL COMMUNICATIONS, no. 7, 1993, pages 598 - 599
JOURNAL OF THE CHEMICAL SOCIETY OF JAPAN, no. 3, 1972, pages 596 - 598
JOURNAL OF THE CHEMICAL SOCIETY OF JAPAN, vol. 56, no. 11, 1953, pages 81 - 83
J. CHEM. SOC., PERKIN TRANS. I, pages 344 - 348
See also references of EP 3725815A4
Attorney, Agent or Firm:
SAEGUSA & PARTNERS (JP)
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