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Patent Searching and Data


Title:
ACTIVE ENERGY RAY-CURABLE RESIN COMPOSITION, MICRORELIEF STRUCTURE, AND METHOD FOR PRODUCING MICRORELIEF STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2012/096322
Kind Code:
A1
Abstract:
Provided is an active energy ray-curable resin composition which contains a multifunctional monomer that has at least three radically polymerizable functional groups in each molecule. A cured product of the active energy ray-curable resin composition provides a microrelief structure which exhibits an antireflective function due to a microrelief pattern formed on the surface thereof, while having high scratch resistance and excellent dirt removal performance such as fingerprint removal performance.

Inventors:
TAKIHARA TSUYOSHI (JP)
OKAMOTO EIKO (JP)
OTANI GO (JP)
NAKAI YUSUKE (JP)
Application Number:
JP2012/050415
Publication Date:
July 19, 2012
Filing Date:
January 12, 2012
Export Citation:
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Assignee:
MITSUBISHI RAYON CO (JP)
TAKIHARA TSUYOSHI (JP)
OKAMOTO EIKO (JP)
OTANI GO (JP)
NAKAI YUSUKE (JP)
International Classes:
C08F290/06; B29C59/04; C08F220/28; C08F299/00; G02B1/11; G02B1/118; H01L21/027
Foreign References:
JP2010000719A2010-01-07
JP2002216845A2002-08-02
JPH10166734A1998-06-23
JPH04247336A1992-09-03
JPH02274713A1990-11-08
JP2000071290A2000-03-07
JP2002107501A2002-04-10
JP4156415B22008-09-24
JP2007084625A2007-04-05
Other References:
See also references of EP 2664636A4
Attorney, Agent or Firm:
MIYAZAKI, Teruo et al. (JP)
Akio Miyazaki (JP)
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Claims: