Title:
ACTIVE GAS GENERATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/123814
Kind Code:
A1
Abstract:
The purpose of the present disclosure is to provide an active gas generation device which is structured to jet a high-quality active gas containing no impurities. This active gas generation device (100C) is provided with a gas separation structure in which a flow of the gas between a housing internal space (33) and a discharge space (6C) is divided by a cooling plate (9), an electrode retention member (8), and a high-voltage application electrode part (1C). The active gas generation device (100C) is further provided with an auxiliary metal electrode (12) which is disposed on an upper surface of an electrode dielectric film (11) of the high-voltage application electrode part (1C). The auxiliary metal electrode (12) is disposed so as to overlap with a part of an active gas flow path in a plan view and is set to the ground potential.
More Like This:
| WO/2022/131921 | TREATMENT PAD FOR A DIELECTRIC BARRIER DISCHARGE PLASMA TREATMENT |
| WO/2012/005132 | PLASMA IRRADIATION TREATMENT DEVICE |
| WO/2004/079811 | PLASMA PROCESSING APPARATUS AND METHOD |
Inventors:
ARITA REN (JP)
WATANABE KENSUKE (JP)
WATANABE KENSUKE (JP)
Application Number:
PCT/JP2021/024082
Publication Date:
June 16, 2022
Filing Date:
June 25, 2021
Export Citation:
Assignee:
TOSHIBA MITSUBISHI ELEC IND (JP)
International Classes:
H05H1/24
Domestic Patent References:
| WO2019229873A1 | 2019-12-05 | |||
| WO2019229873A1 | 2019-12-05 |
Foreign References:
| JP2016085935A | 2016-05-19 | |||
| JP2010521808A | 2010-06-24 | |||
| JP2007294229A | 2007-11-08 | |||
| JP2005108482A | 2005-04-21 |
Other References:
See also references of EP 4072249A4
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
Download PDF: