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Title:
ACTIVE MATRIX SUBSTRATE, OPTICAL SHUTTER SUBSTRATE, DISPLAY DEVICE, AND METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2018/003633
Kind Code:
A1
Abstract:
Provided is an active matrix substrate in which the disconnection of metal films in a contact hole is less likely to occur. The active matrix substrate includes, on a glass substrate (1), first to third insulating films (4, 6, 11), first to third metal films (5, 9, 12), and a contact hole (CH) for electrically connecting the first and second metal films (5, 9). The contact hole (CH) includes first to third holes (H1, H2, H3) formed in the first to third insulating films (4, 6, 11), respectively. The first and third metal films (5, 12) are brought into contact with each other inside the first hole (H1), an oxide semiconductor film (7) overlaps the second insulating film (6) in the lower region of the third hole (H3), and the second and third metal films (9, 12) are brought into contact with each other inside or in the lower region of the third hole (H3) above the first insulating film (4).

Inventors:
OKABE TOHRU
NISHIKI HIROHIKO
YANEDA TAKESHI
Application Number:
PCT/JP2017/022877
Publication Date:
January 04, 2018
Filing Date:
June 21, 2017
Export Citation:
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Assignee:
SHARP KK (JP)
International Classes:
G09F9/30; G02B26/02; G09F9/37; H01L27/32; H01L51/50; H05B33/22
Domestic Patent References:
WO2012023226A12012-02-23
WO2013008441A12013-01-17
WO2011114404A12011-09-22
WO2011142064A12011-11-17
WO2012169388A12012-12-13
Foreign References:
JP2016057547A2016-04-21
US20160133682A12016-05-12
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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