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Title:
ACTIVE PARTICLE SUPPLY DEVICE, AND WATER TREATMENT SYSTEM USING SAME
Document Type and Number:
WIPO Patent Application WO/2022/185429
Kind Code:
A1
Abstract:
An active particle supply device (4) including: an ejector (10) that includes a contact part (13) in a space where water (2) to be treated is injected from a nozzle (12) and the pressure around the injected water (2) to be treated is reduced by the Venturi effect, that has a dielectric (15) disposed on the top surface of the contact part (13), and that includes a supply port (16) through which oxygen gas is supplied to the contact part (13); and a plasma generation device (11) that generates, in the contact part (13), plasma (100) for generating active particles in the oxygen gas.

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Inventors:
SHIOTA ARUFA (JP)
KUZUMOTO MASAKI (JP)
OINUMA GAKU (JP)
Application Number:
PCT/JP2021/008070
Publication Date:
September 09, 2022
Filing Date:
March 03, 2021
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP (JP)
International Classes:
B01J19/08; C02F1/48
Domestic Patent References:
WO2016017456A12016-02-04
WO2015064382A12015-05-07
Foreign References:
JP6818952B12021-01-27
JP2009072716A2009-04-09
Attorney, Agent or Firm:
PALMO PATENT FIRM, P.C. (JP)
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