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Title:
ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METOHD FOR FORMING PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/187445
Kind Code:
A1
Abstract:
Provided are: an active-ray-sensitive or radiation-sensitive resin composition which can be prevented from the change in line width of a pattern due to post-exposure delay; a resist film using the active-ray-sensitive or radiation-sensitive resin composition; a method for forming a pattern; and a method for manufacturing an electronic device. The active-ray-sensitive or radiation-sensitive resin composition comprises: a resin A having a repeating unit that has an acid-degradable group in which a polar group is protected by a protection group capable of being detached by the action of an acid; and a compound represented by general formula (1).

Inventors:
YAGI Kazunari (4000 Kawashiri, Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
GOTO Akiyoshi (4000 Kawashiri, Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
KAWASHIMA Takashi (4000 Kawashiri, Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
Application Number:
JP2018/048093
Publication Date:
October 03, 2019
Filing Date:
December 27, 2018
Export Citation:
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Assignee:
FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome Minato-k, Tokyo 20, 〒1068620, JP)
International Classes:
G03F7/004; C07C59/60; C07C309/57; C07C317/44; C07C321/28; C07C381/12; G03F7/038; G03F7/039; G03F7/20
Foreign References:
JP2014177449A2014-09-25
JP2013167731A2013-08-29
JP2009244805A2009-10-22
JP2017197489A2017-11-02
JP6255499B22017-12-27
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (6F FFTP M0 BLDG, 1250 Takematsu Minamiashigara-sh, Kanagawa 11, 〒2500111, JP)
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