Title:
ADDITIVE FOR POLISHING AGENT, AND POLISHING METHOD
Document Type and Number:
WIPO Patent Application WO/2013/099595
Kind Code:
A1
Abstract:
The present invention relates to an additive for a polishing agent that is added to a repeatedly used polishing agent from time to time between repeated uses, whereby the decrease in polishing characteristics, and particularly polishing speed, of the polishing agent can be suppressed. The present invention also relates to a polishing method in which a repeatedly used polishing agent is used, wherein the decrease in polishing characteristics, and particularly polishing speed, of the polishing agent can be suppressed.
Inventors:
YOSHIDA YUIKO (JP)
YOSHIDA IORI (JP)
TAKEMIYA SATOSHI (JP)
YOSHIDA IORI (JP)
TAKEMIYA SATOSHI (JP)
Application Number:
PCT/JP2012/082109
Publication Date:
July 04, 2013
Filing Date:
December 11, 2012
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
International Classes:
H01L21/304; B24B37/00; B24B57/02; C09K3/14
Domestic Patent References:
| WO2010001961A1 | 2010-01-07 |
Foreign References:
| JP2008192656A | 2008-08-21 | |||
| JP4179448B2 | 2008-11-12 | |||
| JP2009059908A | 2009-03-19 | |||
| JPH11277380A | 1999-10-12 | |||
| JP2007073686A | 2007-03-22 | |||
| JP2005313030A | 2005-11-10 |
Attorney, Agent or Firm:
HAMADA Yuriko et al. (JP)
Yuriko Hamada (JP)
Yuriko Hamada (JP)
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