ADDITIVE, AND RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SAID ADDITIVE

WIPO Patent Application WO/2015/146443

A1

[Problem] To provide: an additive for use in a composition for forming a resist underlayer film; and a composition for forming a resist underlayer film, which contains the additive. [Solution] An additive for use in a composition for forming a resist underlayer film, said additive comprising a copolymer having structural units respectively represented by formulae (1) to (4); and a composition for forming a resist underlayer film, which contains the additive. (In the formulae, R1's independently represent a hydrogen atom or a methyl group; Ar represents an arylene group; Pr represents a protecting group or a hydrogen atom; X represents a direct bond or a -C(=O)O-R2- group, wherein R2 that constitutes the -C(=O)O-R2- group represents an alkylene group having 1 to 3 carbon atoms and the alkylene group can bind to a sulfur atom; R3 represents a hydrogen atom, a methyl group, a methoxy group or a halogeno group; R4 represents an alkyl group which has 1 to 3 carbon atoms and in which at least one hydrogen atom is substituted by a fluoro group; and Z represents an organic group having a 4- to 7-membered lactone, adamantane or norbornane backbone.)

HASHIMOTO YUTO (JP)
SAKAIDA YASUSHI (JP)
TAKASE KENJI (JP)
SAKAMOTO RIKIMARU (JP)

PCT/JP2015/055445

October 01, 2015

February 25, 2015

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NISSAN CHEMICAL IND LTD (JP)

G03F7/11; C08F12/22; C08F220/10; C09D7/65; H01L21/027

WO2010074075A1

2010-07-01

JP2011164345A	2011-08-25
JPH06130706A	1994-05-13
JPH0673130A	1994-03-15
US4940760A	1990-07-10

HANABUSA PATENT & TRADEMARK OFFICE (JP)
Patent business corporation なぶさ patent trademark office (JP)

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