Title:
ADDITIVE FOR USE IN POLYMER, ADDITIVE COMPOSITION AND POLYMERIC COMPOSITION OF THE ADDITIVE, AND USES THEREOF AS LIGHT STABILIZER
Document Type and Number:
WIPO Patent Application WO/2017/140172
Kind Code:
A1
Abstract:
An additive A for use in a polymer. The additive comprises a compound as represented by formula I, where R1 and R2 are either identical or different and represent H, a C1-C8 alkyl or C6-C18 aryl, and R3 is either H or a halogen. The additive A also comprises silicon and phosphorus. When added to the polymer, the additive A for use in the polymer significantly improves the chemical resistance of a polymer composition.
Inventors:
HUANG XIURU (CN)
Application Number:
PCT/CN2016/111237
Publication Date:
August 24, 2017
Filing Date:
December 21, 2016
Export Citation:
Assignee:
HUANG XIURU (CN)
International Classes:
C08K13/04; C08K3/02; C08K3/32; C08K3/34; C08K5/3475; C08K5/50; C08K5/5415; C08K13/02; C08L23/12; C08L25/06; C08L83/04
Foreign References:
| CN105601995A | 2016-05-25 | |||
| CN105602009A | 2016-05-25 | |||
| CN101497742A | 2009-08-05 | |||
| CN101492566A | 2009-07-29 | |||
| CN103044888A | 2013-04-17 | |||
| CN101654532A | 2010-02-24 | |||
| CN104262678A | 2015-01-07 |
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