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Title:
ADHESION METHOD USING GRAY-SCALE PHOTOLITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO2005001573
Kind Code:
A3
Abstract:
A method for adhering substrates using gray-scale photolithography includes: (a) applying a photopatternable composition to a surface of a substrate to form a film; (b) exposing a portion of the film to radiation having a wavelength of from 150 to 800 nm through a gray-scale photomask to produce an exposed film having non-exposed regions covering at least a portion of the surface; (c) heating the exposed film for an amount of time such that the exposed regions are substantially insoluble in a developing solvent and the non­exposed regions are soluble in the developing solvent; (d) removing the non-exposed regions of the heated film with the developing solvent to form a patterned film; (e) heating the patterned film for an amount of time sufficient to form a cured patterned film having a surface; (f) activating the surface of the cured patterned film and a surface of an adherend; (g) contacting the activated. surface of the cured patterned film with the activated surface of the adherend. The photopatternable composition includes: (A) an organopolysiloxane containing an average of at least two silicon-bonded unsaturated organic groups per molecule, (B) an organosilicon compound containing an average of at least two silicon-bonded hydrogen atoms per molecule in a concentration sufficient to cure the composition, and (C) a catalytic amount of a photoactivated hydrosilylation catalyst.

Inventors:
GARDNER GEOFFREY (US)
LEE YEONG JOO (US)
Application Number:
PCT/US2004/015641
Publication Date:
May 26, 2005
Filing Date:
May 19, 2004
Export Citation:
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Assignee:
DOW CORNING (US)
GARDNER GEOFFREY (US)
LEE YEONG JOO (US)
International Classes:
G03F1/00; G03F7/075; G03F7/40; H01L21/58; H01L21/98; G03F7/20; (IPC1-7): G03F7/075; G03F1/00
Domestic Patent References:
WO2002067292A22002-08-29
WO2003041130A22003-05-15
Foreign References:
US20020053730A12002-05-09
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