Title:
ADHESIVE FOR PELLICLE, PELLICLE, EXPOSURE ORIGINAL PLATE WITH PELLICLE, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, LIQUID CRYSTAL DISPLAY PANEL MANUFACTURING METHOD, EXPOSURE ORIGINAL PLATE REGENERATION METHOD AND PEELING RESIDUE REDUCING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/213662
Kind Code:
A1
Abstract:
[Problem] To provide an adhesive for a pellicle that can reduce the amount of residue on an exposure original plate when the pellicle is peeled off from the exposure original plate after using lithography, in particular ArF lithography, and also to provide a pellicle, an exposure original plate with the pellicle, an exposure original plate regeneration method, and a peeling residue reducing method. [Solution] An adhesive for a pellicle for attaching the pellicle to an exposure original plate, the adhesive containing a polyvinyl ether compound.
Inventors:
HAMADA YUICHI (JP)
NISHIMURA AKINORI (JP)
NISHIMURA AKINORI (JP)
Application Number:
PCT/JP2020/016628
Publication Date:
October 22, 2020
Filing Date:
April 15, 2020
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
G03F1/62; G03F7/20; H01L21/683
Foreign References:
| US20180290182A1 | 2018-10-11 | |||
| JP2007156397A | 2007-06-21 | |||
| JP2016018008A | 2016-02-01 | |||
| JP2018013583A | 2018-01-25 | |||
| JP2007041545A | 2007-02-15 | |||
| JP2003096215A | 2003-04-03 | |||
| JP2003082302A | 2003-03-19 | |||
| JPS5638693B2 | 1981-09-08 | |||
| JP2016018008A | 2016-02-01 | |||
| JP2006146085A | 2006-06-08 | |||
| JP2008021182A | 2008-01-31 | |||
| JPS5513616B2 | 1980-04-10 |
Other References:
See also references of EP 3958061A4
Attorney, Agent or Firm:
SHIMAZAKI Eiichiro (JP)
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