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Title:
AFX-STRUCTURE ZEOLITE MEMBRANE, MEMBRANE STRUCTURE, AND MEMBRANE STRUCTURE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/180564
Kind Code:
A1
Abstract:
In an x-ray diffraction pattern obtained by irradiating the membrane surface of an AFX membrane (20) with x-rays, the peak intensity in the (004) plane is at least 3 times the peak intensity in the (110) plane.

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Inventors:
HAGIO TAKESHI (JP)
NODA KENICHI (JP)
MIYAHARA MAKOTO (JP)
SHIMIZU KATSUYA (JP)
Application Number:
PCT/JP2018/010333
Publication Date:
October 04, 2018
Filing Date:
March 15, 2018
Export Citation:
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Assignee:
NGK INSULATORS LTD (JP)
International Classes:
B01D71/02; B01D69/00; B01D69/10; B01D69/12; C01B39/04; C01B39/54
Domestic Patent References:
WO2016121889A12016-08-04
WO2016121888A12016-08-04
WO2016121887A12016-08-04
Foreign References:
JP2016169139A2016-09-23
JP2016147801A2016-08-18
JP2016204245A2016-12-08
US20160137518A12016-05-19
Attorney, Agent or Firm:
SHINJYU GLOBAL IP (JP)
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