Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
AG ALLOY FILM AND AG ALLOY SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2021/111974
Kind Code:
A1
Abstract:
The Ag alloy film comprises an Ag alloy containing In and Ge, and has an InGe-rich part containing In and Ge at high concentrations on the surface side thereof. It is preferred that the Ag alloy contains 0.1 to 1.5% by mass inclusive of In and 0.1 to 7.5% by mass inclusive of Ge, with the remainder comprising Ag and unavoidable impurities.

More Like This:
JPS6119746SPECTRAL REFLECTANCE VARIABLE ALLOY AND RECORDING MATERIAL
JP2007197829SPUTTERING TARGET HAVING HIGH MELTING POINT PHASE
Inventors:
HAYASHI YUJIRO (JP)
KOMIYAMA SHOZO (JP)
Application Number:
PCT/JP2020/044001
Publication Date:
June 10, 2021
Filing Date:
November 26, 2020
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
MITSUBISHI MATERIALS CORP (JP)
International Classes:
C22C5/06; C23C14/14; C22F1/00; C22F1/14; C23C14/34; H01L27/32; H01L51/50; H05B33/26
Domestic Patent References:
WO2016136590A12016-09-01
Foreign References:
JP2019143242A2019-08-29
JP2016194108A2016-11-17
JP2013151735A2013-08-08
JP2015028211A2015-02-12
JP2005100604A2005-04-14
JP2010225586A2010-10-07
JP2005332557A2005-12-02
Attorney, Agent or Firm:
MATSUNUMA Yasushi et al. (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: BARRIER PAPER, CONTAINER AND LID MEMBER CONTAINING SAID BARRIER PAPER, AND METHOD FOR PRODUCING BARR...

Next Patent: INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, AND INFORMATION PROCESSING PROGRAM