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Title:
AG ALLOY SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2021/112004
Kind Code:
A1
Abstract:
A Ag alloy sputtering target characterized by comprising a Ag alloy that has a compositional makeup in which Ge, In, and S are contained and the remaining portion is Ag and unavoidable impurities, wherein the contained amount of S in the Ag alloy is 1-150 mass ppm. The Ag alloy preferably contains In in a range of 0.1-1.5 mass% and Ge in a range of 0.1-7.5 mass%.

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Inventors:
HAYASHI YUJIRO (JP)
KOMIYAMA SHOZO (JP)
Application Number:
PCT/JP2020/044230
Publication Date:
June 10, 2021
Filing Date:
November 27, 2020
Export Citation:
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Assignee:
MITSUBISHI MATERIALS CORP (JP)
International Classes:
C23C14/34; C22C5/06; C22F1/00; C22F1/14
Domestic Patent References:
WO2016136590A12016-09-01
WO2007114439A12007-10-11
Foreign References:
JP2019143242A2019-08-29
JP2016194108A2016-11-17
Attorney, Agent or Firm:
MATSUNUMA Yasushi et al. (JP)
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