Title:
Al ALLOY THIN FILM, LIGHT EMITTING ELEMENT AND SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2019/044285
Kind Code:
A1
Abstract:
An Al alloy thin film according to one embodiment of the present invention is directly or indirectly laminated on a substrate that has a refractive index of from 1.5 to 2.0 (inclusive) and has an average film thickness of from 50 nm to 2,000 nm (inclusive), while containing a rare earth element. This Al alloy thin film is configured such that: the maximum crystal grain size of intermetallic compounds of the rare earth element is 300 nm or less, said intermetallic compounds being present in a region that is within ± 20% of the thickness of the Al alloy thin film using the center in the thickness direction as a base line; the intermetallic compounds are present in a dispersed state, with the distance between adjacent intermetallic compounds being 2,000 nm or less; and the reflectance from the substrate side is 60% or more.
Inventors:
YOSHIDA SHINTARO
OKUNO HIROYUKI
OKUNO HIROYUKI
Application Number:
PCT/JP2018/027750
Publication Date:
March 07, 2019
Filing Date:
July 24, 2018
Export Citation:
Assignee:
KOBELCO RES INSTITUTE INC (JP)
International Classes:
C23C14/14; C22C21/00; C23C14/34; H01L21/28; H01L21/285; H01L33/40; H01L51/50; H05B33/02; H05B33/24; H05B33/26
Domestic Patent References:
| WO2017134879A1 | 2017-08-10 |
Foreign References:
| JP2014120486A | 2014-06-30 | |||
| JP2013253278A | 2013-12-19 | |||
| JP2014044233A | 2014-03-13 |
Attorney, Agent or Firm:
AMANO Kazunori (JP)
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