Title:
AL-BASED ALLOY SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2012/073831
Kind Code:
A1
Abstract:
The present invention provides an Al-based alloy sputtering target which is capable of improving the alkali corrosion resistance of an Al-Nd/La alloy that is widely used as a wiring material which has low electrical resistivity and excellent heat resistance. This Al-based alloy sputtering target is formed from an Al-based alloy that contains Nd and/or La in an amount of 0.1-3% by atom, and the amount of Fe contained in the Al-based alloy is controlled to be 1/76 or less of the total amount of Nd and/or La.
Inventors:
OMOTO Seiichiro (())
大元 誠一郎 (())
大元 誠一郎 (())
Application Number:
JP2011/077215
Publication Date:
June 07, 2012
Filing Date:
November 25, 2011
Export Citation:
Assignee:
KOBELCO RESEARCH INSTITUTE, INC. (1-5-1, Wakinohama-kaigan-dori Chuo-ku, Kobe-sh, Hyogo 73, 〒6510073, JP)
株式会社コベルコ科研 (〒73 兵庫県神戸市中央区脇浜海岸通１丁目５番１号 Hyogo, 〒6510073, JP)
OMOTO Seiichiro (())
株式会社コベルコ科研 (〒73 兵庫県神戸市中央区脇浜海岸通１丁目５番１号 Hyogo, 〒6510073, JP)
OMOTO Seiichiro (())
International Classes:
C23C14/34; G02F1/1343; G06F3/041; G09F9/30
Attorney, Agent or Firm:
OGURI Shohei et al. (Eikoh Patent Firm, Toranomon East Bldg. 10F 7-13, Nishi-Shimbashi 1-chome, Minato-k, Tokyo 03, 〒1050003, JP)
Claims:
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