Title:
AL-BASED ALLOY SPUTTERING TARGET
Document Type and Number:
WIPO Patent Application WO/2012/073831
Kind Code:
A1
Abstract:
The present invention provides an Al-based alloy sputtering target which is capable of improving the alkali corrosion resistance of an Al-Nd/La alloy that is widely used as a wiring material which has low electrical resistivity and excellent heat resistance. This Al-based alloy sputtering target is formed from an Al-based alloy that contains Nd and/or La in an amount of 0.1-3% by atom, and the amount of Fe contained in the Al-based alloy is controlled to be 1/76 or less of the total amount of Nd and/or La.
Inventors:
OMOTO SEIICHIRO
TAKAGI TOSHIAKI
TAKAGI TOSHIAKI
Application Number:
PCT/JP2011/077215
Publication Date:
June 07, 2012
Filing Date:
November 25, 2011
Export Citation:
Assignee:
KOBELCO RES INST INC (JP)
OMOTO SEIICHIRO
TAKAGI TOSHIAKI
OMOTO SEIICHIRO
TAKAGI TOSHIAKI
International Classes:
C23C14/34; G02F1/1343; G06F3/041; G09F9/30
Foreign References:
| JP2004055842A | 2004-02-19 |
Attorney, Agent or Firm:
OGURI Shohei et al. (JP)
Shohei Oguri (JP)
Shohei Oguri (JP)
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Claims:
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