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Title:
ALICYCLIC EPOXY (METH)ACRYLATES, PROCESS FOR PRODUCTION THEREOF, AND COPOLYMERS
Document Type and Number:
WIPO Patent Application WO/2006/059564
Kind Code:
A1
Abstract:
Novel compounds each having a 3,4-epoxytricyclo[5.2.1.02,6]- decane skeleton and a polymerizable unsaturated bond; a process for the production thereof; and a copolymer composed of (A) units derived from a monomer having an alkali-soluble group, (B) units derived from an epoxy-containing polymerizable unsaturated compound and, if necessary, (C) units derived from an epoxy-free polymerizable unsaturated compound such as N-substituted maleimide, characterized in that the units (B) account for 40 to 90 wt% of the whole of the units of the copolymer and the units derived from a specific monomer having a 3,4-epoxy- tricyclo[5.2.1.02,6]decane skeleton account for at least 30 wt% of the whole of the units (B). The copolymer can give film excellent in heat resistance and so on and the resin compositions containing the copolymer are extremely excellent in storage stability, while the copolymer is easy of synthesis.

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Inventors:
TAKAI HIDEYUKI (JP)
IYOSHI SHUSO (JP)
NIJUKKEN TOSHIHIKO (JP)
MORI MISAO (JP)
Application Number:
PCT/JP2005/021794
Publication Date:
June 08, 2006
Filing Date:
November 28, 2005
Export Citation:
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Assignee:
DAICEL CHEM (JP)
TAKAI HIDEYUKI (JP)
IYOSHI SHUSO (JP)
NIJUKKEN TOSHIHIKO (JP)
MORI MISAO (JP)
International Classes:
C07D303/32; C07D301/06; C07D301/12; C07D301/19; C08F212/08; C08F220/10; C08F220/26; C08F222/40; C07B61/00
Domestic Patent References:
WO2001019888A12001-03-22
WO2003072638A12003-09-04
Foreign References:
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JPH03240780A1991-10-28
JPS6281378A1987-04-14
JPH0441485A1992-02-12
US20030224283A12003-12-04
US20010021482A12001-09-13
US6106998A2000-08-22
EP0468840A21992-01-29
GB2219591A1989-12-13
GB2191495A1987-12-16
GB2202538A1988-09-28
GB2212165A1989-07-19
GB2212164A1989-07-19
GB2212507A1989-07-26
EP0392029A11990-10-17
EP0793145A11997-09-03
GB984829A1965-03-03
JPH02240126A1990-09-25
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JPH11311862A1999-11-09
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JPH05247402A1993-09-24
JPH04370169A1992-12-22
US20020016431A12002-02-07
JPH049848A1992-01-14
Other References:
ALLEN R.D. ET AL.: "High speed, aqueous developing negative resist based on triflic acid catalyzed epoxy polymerization", PROCEEDINGS OF SPIE-THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, (ADV. RESIST. TECHNOL. PROCESS. IX), vol. 1672, 1992, pages 513 - 525, XP002999581
FORT Y. ET AL.: "Synthesis of epoxy (meth) acrylic esters by selective epoxidation of unsaturated (meth) acrylic esters using the system hydrogen peroxide-sodium tungstate (Na2WO4) under phase transfer catalysis", TETRAHEDRON, vol. 48, no. 24, 1992, pages 5099 - 5110, XP002066250
TESHIGAHARA S. ET AL.: "Synthesis of alicyclic epoxy (meth) acrylates", JOURNAL OF TOSOH RESEARCH, vol. 35, no. 2, 1991, pages 47 - 56, XP001000348
NAKANO K. ET AL.: "Adhesion characteristics of alicyclic polymers for use in ArF excimer laser lithography", PROCEEDINGS OF SPIE-THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING (PART 1, ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV), vol. 3333, 1998, pages 43 - 52, XP002999582
MAEDA K. ET AL.: "ArF chemically amplified negative resist using alicyclic epoxy polymer", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 11, no. 3, 1998, pages 507 - 512, XP000997826
See also references of EP 1818327A4
Attorney, Agent or Firm:
Goto, Yukihisa (7-16 Higashitenma 2-chome, Kita-k, Osaka-shi Osaka 44, JP)
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