ALIGNER, EXPOSURE METHOD USING THE ALIGNER, AND METHOD OF MANUFACTURE OF CIRCUIT DEVICE

Title:

ALIGNER, EXPOSURE METHOD USING THE ALIGNER, AND METHOD OF MANUFACTURE OF CIRCUIT DEVICE

Document Type and Number:

WIPO Patent Application WO/1998/048451

Kind Code:

A1

Abstract:

A reflective member is fixedly or movably provided near the pupil plane of a projection optical system with which a projection aligner is equipped. A collimated measuring beam with an exposure wavelength is incident from the object plane side or image plane side of the projection optical system, and the intensity of the beam reflected by the reflective member is detected photoelectrically to measure a value corresponding to the attenuation factor (transmissivity or reflectivity) of the projection optical system or the variation with time of the attenuation factor (transmissivity or reflectivity) of the projection optical system. In accordance with the measurement results, the exposure conditions when a photosensitive substrate is exposed are corrected to avoid the deterioration of the exposure control precision due to the variation of the attenuation factor (transmissivity variation or reflectivity variation) which is caused in the projection optical system and illumination optical system of a projection aligner which uses ultraviolet illuminating light.

Inventors:

NISHI KENJI (JP)
KIUCHI TORU (JP)

Application Number:

PCT/JP1998/001776

Publication Date:

October 29, 1998

Filing Date:

April 17, 1998

Export Citation:

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Assignee:

NIKON CORP (JP)
NISHI KENJI (JP)
KIUCHI TORU (JP)

International Classes:

G03F7/20; (IPC1-7): H01L21/027; G03F7/20

Foreign References:

JPH0677107A	1994-03-18
JPH02106917A	1990-04-19
JPH0729810A	1995-01-31
JPH05335208A	1993-12-17

Other References: